Microscope objectives designations
Nikon CF Objectives 210mm
Objectives:
- LWD - Long working distance
- ELWD - Extra long working distance
- SLWD - Super long working distance
- w/corr - With correction collar for coverslip or coating thickness
- M - Metallurgical objectives (210mm)
- DI - Interferometry; double beam, Mirau
- TI - Interferometry; multiple beam, Michaelson
- MI - Interferometry; multiple beam, Tolansky
- DIC - Differential Interference Contrast
- PM - For polarized light; reflected
- PLAN - Flat field
- Fluor - High UV transmission
- PC - Objective used for viewing specimen with polycarbonate surface film layer
- PMMA - Objective used for viewing specimen with polymethyl methacrylate surface film layer
Eyepieces:
- CFWN - High eyepoint widefield eyepiece
- CFUWN - High eyepoint ultra widefield eypiece
- PM - Eyepiece designation-photomask reticle
- CM - Eyepiece designation-crossline reticle for polarizing microscope
- CR - Eyepiece designation-concentric circles for photometer
- CFS - Eyepiece designation for use with MI and DI objectives